Advances in Imaging and Electron Physics, Volume 227 in the Advances in Imaging and Electron Physics series, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.
1. Introduction - p. xv 2. Chapter One: The electron optical imaging system and its aberrations - p. 1 3. Abstract - p. 1 4. 1.1 Fundamentals (; ) - p. 2 5. 1.2 Geometrical aberrations of rotationally symmetric electron optical systems (; ; ) - p. 28 6. 1.3 Chromatic, asymmetric and diffraction aberration - p. 47 7. 1.4 The measurement and correction of aberration - p. 65 8. 1.5 Asymptotic aberrations of rotationally symmetric lenses - p. 71 9. 1.6 The linear transformation of Gaussian trajectory parameters and its influence upon aberrations (; ) - p. 88 10. References - p. 88 11. Chapter Two: The electromagnetic deflection system and its aberrations - p. 89 12. Abstract - p. 89 13. 2.1 Fundamentals of the magnetic deflection system - p. 90 14. 2.2 Third order aberrations of magnetic deflection systems - p. 96 15. 2.3 Fundamentals of the electrostatic defection system and its aberrations (; ) - p. 108 16. 2.4 The combined system (magnetic round lens with magnetic deflector) and its aberrations - p. 112 17. 2.5 The combined system (electrostatic round lens with magnetic deflector) and its aberrations (, ,) - p. 126 18. 2.6 Applications of the theory for the combined system - p. 131 19. References - p. 136 20. Chapter Three: The electromagnetic multipole system and its aberrations - p. 137 21. Abstract - p. 137 22. 3.1 General expressions for electrostatic and magnetic fields - p. 138 23. 3.2 Analysis and calculation of static electromagnetic multipole fields (, ; , ) - p. 145 24. 3.3 Electron optical properties and geometrical aberrations for electromagnetic multipole systems - p. 151 25. 3.4 Asymptotic aberrations of quadrupole lenses - p. 165 26. 3.5 Chromatic aberration of electromagnetic multipole systems - p. 170 27. 3.6 Application of the multipoles as an aberration corrector - p. 173 28. 3.7 Image defects caused by imperfections in manufacture and alignment (; ; ) - p. 181 29. References - p. 185 30. Chapter Four: The ion optical system and its aberrations - p. 189 31. Abstract - p. 190 32. 4.1 Fundamentals - p. 191 33. 4.2 Ion lenses and Gaussian dioptrics - p. 204 34. 4.3 The second order aberration theory - p. 219 35. 4.4 Generalization of the second order aberration theory - p. 243 36. 4.5 Developments in double focusing mass spectrometers - p. 269 37. References - p. 272 38. Chapter Five: Computer aided design of electron and ion optical systems - p. 275 39. Abstract - p. 275 40. 5.1 Calculation of electromagnetic fields by the finite difference method - p. 276 41. 5.2 Calculation of electromagnetic multipole fields by the Fourier expansion method - p. 284 42. 5.3 The calculation of electromagnetic fields by the finite element method (; ; ) - p. 293 43. 5.4 The calculation of charged particle trajectories - p. 303 44. 5.5 The calculation of Gaussian optical parameters and aberration coefficients - p. 310 45. References - p. 317 46. Afterword: The life and work of Jiye Ximen - p. 319 47. Author Index - p. 337 48. Subject Index - p. 337
Advances in Imaging and Electron Physics, Volume 227 in the Advances in Imaging and Electron Physics series, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.
1. Introduction - p. xv 2. Chapter One: The electron optical imaging system and its aberrations - p. 1 3. Abstract - p. 1 4. 1.1 Fundamentals (; ) - p. 2 5. 1.2 Geometrical aberrations of rotationally symmetric electron optical systems (; ; ) - p. 28 6. 1.3 Chromatic, asymmetric and diffraction aberration - p. 47 7. 1.4 The measurement and correction of aberration - p. 65 8. 1.5 Asymptotic aberrations of rotationally symmetric lenses - p. 71 9. 1.6 The linear transformation of Gaussian trajectory parameters and its influence upon aberrations (; ) - p. 88 10. References - p. 88 11. Chapter Two: The electromagnetic deflection system and its aberrations - p. 89 12. Abstract - p. 89 13. 2.1 Fundamentals of the magnetic deflection system - p. 90 14. 2.2 Third order aberrations of magnetic deflection systems - p. 96 15. 2.3 Fundamentals of the electrostatic defection system and its aberrations (; ) - p. 108 16. 2.4 The combined system (magnetic round lens with magnetic deflector) and its aberrations - p. 112 17. 2.5 The combined system (electrostatic round lens with magnetic deflector) and its aberrations (, ,) - p. 126 18. 2.6 Applications of the theory for the combined system - p. 131 19. References - p. 136 20. Chapter Three: The electromagnetic multipole system and its aberrations - p. 137 21. Abstract - p. 137 22. 3.1 General expressions for electrostatic and magnetic fields - p. 138 23. 3.2 Analysis and calculation of static electromagnetic multipole fields (, ; , ) - p. 145 24. 3.3 Electron optical properties and geometrical aberrations for electromagnetic multipole systems - p. 151 25. 3.4 Asymptotic aberrations of quadrupole lenses - p. 165 26. 3.5 Chromatic aberration of electromagnetic multipole systems - p. 170 27. 3.6 Application of the multipoles as an aberration corrector - p. 173 28. 3.7 Image defects caused by imperfections in manufacture and alignment (; ; ) - p. 181 29. References - p. 185 30. Chapter Four: The ion optical system and its aberrations - p. 189 31. Abstract - p. 190 32. 4.1 Fundamentals - p. 191 33. 4.2 Ion lenses and Gaussian dioptrics - p. 204 34. 4.3 The second order aberration theory - p. 219 35. 4.4 Generalization of the second order aberration theory - p. 243 36. 4.5 Developments in double focusing mass spectrometers - p. 269 37. References - p. 272 38. Chapter Five: Computer aided design of electron and ion optical systems - p. 275 39. Abstract - p. 275 40. 5.1 Calculation of electromagnetic fields by the finite difference method - p. 276 41. 5.2 Calculation of electromagnetic multipole fields by the Fourier expansion method - p. 284 42. 5.3 The calculation of electromagnetic fields by the finite element method (; ; ) - p. 293 43. 5.4 The calculation of charged particle trajectories - p. 303 44. 5.5 The calculation of Gaussian optical parameters and aberration coefficients - p. 310 45. References - p. 317 46. Afterword: The life and work of Jiye Ximen - p. 319 47. Author Index - p. 337 48. Subject Index - p. 337
